Leskela, S. : rechercher sur Z-Library

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1

Atomic layer deposition (ALD): from precursors to thin film structures

Markku Leskelä, Mikko Ritala

Journal:

Thin Solid Films

Année:

2002

Langue:

english

Fichier:

PDF, 109 KB

english, 2002

2

Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition

Mikko Ritala, Markku Leskelä, Jan-Pieter Dekker, Cees Mutsaers, Pekka J. Soininen, Jarmo Skarp

Journal:

Chemical Vapor Deposition

Année:

1999

Langue:

english

Fichier:

PDF, 263 KB

english, 1999

3

Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

Markku Leskelä, Mikko Ritala

Journal:

Angewandte Chemie International Edition

Année:

2003

Langue:

english

Fichier:

PDF, 243 KB

english, 2003

4

Ruthenium Thin Films Grown by Atomic Layer Deposition

T. Aaltonen, P. Alén, M. Ritala, M. Leskelä

Journal:

Chemical Vapor Deposition

Année:

2003

Langue:

english

Fichier:

PDF, 250 KB

english, 2003

5

Atomic Layer Deposition of Gadolinium Oxide Films

K. Kukli, T. Hatanpää, M. Ritala, M. Leskelä

Journal:

Chemical Vapor Deposition

Année:

2007

Langue:

english

Fichier:

PDF, 320 KB

english, 2007

6

Shame and posttraumatic stress disorder

Jennie Leskela, Michael Dieperink, Paul Thuras

Journal:

Journal of Traumatic Stress

Année:

2002

Langue:

english

Fichier:

PDF, 378 KB

english, 2002

7

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Miikkulainen, Ville, Leskelä, Markku, Ritala, Mikko, Puurunen, Riikka L.

Journal:

Journal of Applied Physics

Année:

2013

Langue:

english

Fichier:

PDF, 6.05 MB

english, 2013

8

Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen

T. Aaltonen, M. Ritala, K. Arstila, J. Keinonen, M. Leskelä

Journal:

Chemical Vapor Deposition

Année:

2004

Langue:

english

Fichier:

PDF, 245 KB

english, 2004

9

The Atomic Layer Deposition of HfO2 and ZrO2 using Advanced Metallocene Precursors and H2O as the Oxygen Source

Charles L. Dezelah IV, Jaakko Niinistö, Kaupo Kukli, Frans Munnik, Jun Lu, Mikko Ritala, Markku Leskelä, Lauri Niinistö

Journal:

Chemical Vapor Deposition

Année:

2008

Langue:

english

Fichier:

PDF, 385 KB

english, 2008

10

Nitrides of titanium, niobium, tantalum and molybdenum grown as thin films by the atomic layer epitaxy method

L. Hiltunen, M. Leskelä, M. Mäkelä, L. Niinistö, E. Nykänen, P. Soininen

Journal:

Thin Solid Films

Année:

1988

Langue:

english

Fichier:

PDF, 288 KB

english, 1988

11

Atomic layer deposition of ZrO2 and HfO2 on deep trenched and planar silicon

Kaupo Kukli, Jaakko Niinistö, Aile Tamm, Jun Lu, Mikko Ritala, Markku Leskelä, Matti Putkonen, Lauri Niinistö, Fuquan Song, Paul Williams, Peter N. Heys

Journal:

Microelectronic Engineering

Année:

2007

Langue:

english

Fichier:

PDF, 3.51 MB

english, 2007

12

SOLUTION-FOCUSED THERAPY IN A PSYCHIATRIC HOSPITAL

Cynthia J. Kok, Jennie Leskela

Journal:

Journal of Marital and Family Therapy

Année:

1996

Langue:

english

Fichier:

PDF, 450 KB

english, 1996

13

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Kaupo Kukli, Jaan Aarik, Aleks Aidla, Indrek Jõgi, Tõnis Arroval, Jun Lu, Timo Sajavaara, Mikko Laitinen, Alma-Asta Kiisler, Mikko Ritala, Markku Leskelä, John Peck, Jim Natwora, Joan Geary, Ronald Sp

Journal:

Thin Solid Films

Année:

2012

Langue:

english

Fichier:

PDF, 1.53 MB

english, 2012

14

Atomic Layer Deposition of Platinum Thin Films

Aaltonen, Titta, Ritala, Mikko, Sajavaara, Timo, Keinonen, Juhani, Leskelä, Markku

Journal:

Chemistry of Materials

Année:

2003

Langue:

english

Fichier:

PDF, 230 KB

english, 2003

15

Proverb interpretation in schizophrenia: the significance of symptomatology and cognitive processes

Scott R Sponheim, Christa Surerus-Johnson, Jennie Leskela, Michael E Dieperink

Journal:

Schizophrenia Research

Année:

2003

Langue:

english

Fichier:

PDF, 201 KB

english, 2003

16

Study of a novel ALD process for depositing MgF2 thin films

Pilvi, Tero, Hatanpää, Timo, Puukilainen, Esa, Arstila, Kai, Bischoff, Martin, Kaiser, Ute, Kaiser, Norbert, Leskelä, Markku, Ritala, Mikko

Journal:

Journal of Materials Chemistry

Année:

2007

Langue:

english

Fichier:

PDF, 438 KB

english, 2007

17

Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd) 2 , and TiF 4 Precursors

Mäntymäki, Miia, Hämäläinen, Jani, Puukilainen, Esa, Sajavaara, Timo, Ritala, Mikko, Leskelä, Markku

Journal:

Chemistry of Materials

Année:

2013

Langue:

english

Fichier:

PDF, 3.18 MB

english, 2013

18

The effect of oxygen source on atomic layer deposited Al2O3 as blocking oxide in metal/aluminum oxide/nitride/oxide/silicon memory capacitors

Nikolaou, Nikolaos, Ioannou-Sougleridis, Vassilios, Dimitrakis, Panagiotis, Normand, Pascal, Skarlatos, Dimitrios, Giannakopoulos, Konstantinos, Kukli, Kaupo, Niinistö, Jaakko, Ritala, Mikko, Leskelä,

Journal:

Thin Solid Films

Année:

2013

Langue:

english

Fichier:

PDF, 906 KB

english, 2013

19

Narrating life stories in between the fictional and the autobiographical

Leskela-Karki, M.

Journal:

Qualitative Research

Année:

2008

Langue:

english

Fichier:

PDF, 113 KB

english, 2008

20

A Pilot Examination of the Use of Narrative Therapy With Individuals Diagnosed With PTSD

Erbes, Christopher R., Stillman, John R., Wieling, Elizabeth, Bera, Walter, Leskela, Jennie

Journal:

Journal of Traumatic Stress

Année:

2014

Langue:

english

Fichier:

PDF, 94 KB

english, 2014

21

Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

K. Kukli, M. Ritala, T. Sajavaara, J. Keinonen, M. Leskelä

Journal:

Chemical Vapor Deposition

Année:

2002

Langue:

english

Fichier:

PDF, 424 KB

english, 2002

22

Atomic layer deposition of Ge2Sb2Te5 thin films

Mikko Ritala, Viljami Pore, Timo Hatanpää, Mikko Heikkilä, Markku Leskelä, Kenichiro Mizohata, Alejandro Schrott, Simone Raoux, Stephen M. Rossnagel

Journal:

Microelectronic Engineering

Année:

2009

Langue:

english

Fichier:

PDF, 623 KB

english, 2009

23

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

S. Dueñas, H. Castán, H. García, J. Barbolla, K. Kukli, J. Aarik, M. Ritala, M. Leskelä

Journal:

Microelectronics Reliability

Année:

2005

Langue:

english

Fichier:

PDF, 388 KB

english, 2005

24

Characterisation of the Al2O3 films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H–SiC devices

Maciej Wolborski, Mietek Bakowski, Armando Ortiz, Viljami Pore, Adolf Schöner, Mikko Ritala, Markku Leskelä, Anders Hallén

Journal:

Microelectronics Reliability

Année:

2006

Langue:

english

Fichier:

PDF, 570 KB

english, 2006

25

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

Kaupo Kukli, Tero Pilvi, Mikko Ritala, Timo Sajavaara, Jun Lu, Markku Leskelä

Journal:

Thin Solid Films

Année:

2005

Langue:

english

Fichier:

PDF, 374 KB

english, 2005

26

Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

Viljami Pore, Mukesh Dimri, Himani Khanduri, Raivo Stern, Jun Lu, Lars Hultman, Kaupo Kukli, Mikko Ritala, Markku Leskelä

Journal:

Thin Solid Films

Année:

2011

Langue:

english

Fichier:

PDF, 1.56 MB

english, 2011

27

Conductance transient, capacitance–voltage and deep-level transient spectroscopy characterization of atomic layer deposited hafnium and zirconium oxide thin films

S. Dueñas, H. Castán, J. Barbolla, K. Kukli, M. Ritala, M. Leskelä

Journal:

Solid-State Electronics

Année:

2003

Langue:

english

Fichier:

PDF, 804 KB

english, 2003

28

Electrochemical quartz crystal microbalance study on cyclic electrodeposition of PbS thin-films

Heini Saloniemi, Marianna Kemell, Mikko Ritala, Markku Leskelä

Journal:

Thin Solid Films

Année:

2001

Langue:

english

Fichier:

PDF, 338 KB

english, 2001

29

Surface roughness reduction in atomic layer epitaxy growth of titanium dioxide thin films

M Ritala, M Leskelä, L Niinistö, T Prohaska, G Friedbacher, M Grasserbauer

Journal:

Thin Solid Films

Année:

1994

Langue:

english

Fichier:

PDF, 2.65 MB

english, 1994

30

Attachment styles, shame, guilt, and collaborative problem-solving orientations

FREDERICK G. LOPEZ, MARK R. GOVER, JENNIE LESKELA, ERIC M. SAUER, LISA SCHIRMER, JAMES WYSSMANN

Journal:

Personal Relationships

Année:

1997

Langue:

english

Fichier:

PDF, 1.04 MB

english, 1997

31

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

R.L. Puurunen, A. Häärä, H. Saloniemi, J. Dekker, M. Kainlauri, H. Pohjonen, T. Suni, J. Kiihamäki, E. Santala, M. Leskelä, H. Kattelus

Journal:

Sensors and Actuators A: Physical

Année:

2012

Langue:

english

Fichier:

PDF, 692 KB

english, 2012

32

Atomic layer deposition of Al2O3 films using AlCl3 and Al(OiPr)3 as precursors

Räisänen, Petri I., Ritala, Mikko, Leskelä, Markku

Journal:

Journal of Materials Chemistry

Année:

2002

Langue:

english

Fichier:

PDF, 190 KB

english, 2002

33

Cycloheptatrienyl-Cyclopentadienyl Heteroleptic Precursors for Atomic Layer Deposition of Group 4 Oxide Thin Films

Niinistö, Jaakko, Hatanpää, Timo, Kariniemi, Maarit, Mäntymäki, Miia, Costelle, Leila, Mizohata, Kenichiro, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Chemistry of Materials

Année:

2012

Langue:

english

Fichier:

PDF, 1.77 MB

english, 2012

34

Precursors as enablers of ALD technology: Contributions from University of Helsinki

Hatanpää, Timo, Ritala, Mikko, Leskelä, Markku

Journal:

Coordination Chemistry Reviews

Année:

2013

Langue:

english

Fichier:

PDF, 7.81 MB

english, 2013

35

Electrodeposition of Cu on Ru Barrier Layers for Damascene Processing

Moffat, T. P., Walker, M., Chen, P. J., Bonevich, J. E., Egelhoff, W. F., Richter, L., Witt, C., Aaltonen, T., Ritala, M., Leskelä, M., Josell, D.

Journal:

Journal of The Electrochemical Society

Année:

2006

Langue:

english

Fichier:

PDF, 1.15 MB

english, 2006

36

High-performance imido–amido precursor for the atomic layer deposition of Ta 2 O 5

Blanquart, Timothee, Longo, Valentino, Niinistö, Jaakko, Heikkilä, Mikko, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Semiconductor Science and Technology

Année:

2012

Langue:

english

Fichier:

PDF, 153 KB

english, 2012

37

Risk-Taking Behaviors and Impulsivity Among Veterans With and Without PTSD and Mild TBI

James, Lisa M., Strom, Thad Q., Leskela, Jennie

Journal:

Military Medicine

Année:

2014

Langue:

english

Fichier:

PDF, 6.71 MB

english, 2014

38

Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition

Castán, H., García, H., Dueñas, S., Bailón, L., Miranda, E., Kukli, K., Kemell, M., Ritala, M., Leskelä, M.

Journal:

Thin Solid Films

Année:

2015

Langue:

english

Fichier:

PDF, 820 KB

english, 2015

39

Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer deposition

Jõgiaas, Taivo, Zabels, Roberts, Tamm, Aile, Merisalu, Maido, Hussainova, Irina, Heikkilä, Mikko, Mändar, Hugo, Kukli, Kaupo, Ritala, Mikko, Leskelä, Markku

Journal:

Surface and Coatings Technology

Année:

2015

Langue:

english

Fichier:

PDF, 1.48 MB

english, 2015

40

Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulses

Mattinen, Miika, Hämäläinen, Jani, Vehkamäki, Marko, Heikkilä, Mikko J., Mizohata, Kenichiro, Jalkanen, Pasi, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku

Journal:

The Journal of Physical Chemistry C

Année:

2016

Langue:

english

Fichier:

PDF, 2.99 MB

english, 2016

41

Response to "Letter Regarding: Rotational Dynamics of the Normal Distal Tibiofibular Joint With Weight-Bearing Computed Tomography"

Lepoja rvi, S., Niinima ki, J., Pakarinen, H., Leskela , H.-V.

Journal:

Foot & Ankle International

Année:

2016

Langue:

english

Fichier:

PDF, 234 KB

english, 2016

42

Towards space-grade 3D-printed, ALD-coated small satellite propulsion components for fluidics

Kestilä, Antti, Nordling, Kalle, Miikkulainen, Ville, Kaipio, Mikko, Tikka, Tuomas, Salmi, Mika, Auer, Aleksi, Leskelä, Markku, Ritala, Mikko

Journal:

Additive Manufacturing

Année:

2018

Langue:

english

Fichier:

PDF, 1.61 MB

english, 2018

43

Synthesis and X-ray Structures of New Mononuclear and Dinuclear Diimine Complexes of Late Transition Metals

Timo V. Laine, Martti Klinga, Markku Leskelä

Journal:

European Journal of Inorganic Chemistry

Année:

1999

Langue:

english

Fichier:

PDF, 254 KB

english, 1999

44

Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

K. Kukli, M. Ritala, M. Schuisky, M. Leskelä, T. Sajavaara, J. Keinonen, T. Uustare, A. Hårsta

Journal:

Chemical Vapor Deposition

Année:

2000

Langue:

english

Fichier:

PDF, 534 KB

english, 2000

45

Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor–Strontium-bis(tri-isopropyl cyclopentadienyl)

M. Vehkamäki, T. Hänninen, M. Ritala, M. Leskelä, T. Sajavaara, E. Rauhala, J. Keinonen

Journal:

Chemical Vapor Deposition

Année:

2001

Langue:

english

Fichier:

PDF, 451 KB

english, 2001

46

Homo- and Copolymerization of Strained Cyclic Olefins with New Palladium(II) Complexes Bearing Ethylene-Bridged Heterodonor Ligands

Adnan S. Abu-Surrah, Kristian Lappalainen, Mika Kettunen, Timo Repo, Markku Leskelä, Hamdallah A. Hodali, Bernhard Rieger

Journal:

Macromolecular Chemistry and Physics

Année:

2001

Langue:

english

Fichier:

PDF, 92 KB

english, 2001

47

Facile Heterolytic H2 Activation by Amines and B(C6F5)3

Victor Sumerin, Felix Schulz, Martin Nieger, Markku Leskelä, Timo Repo, Bernhard Rieger

Journal:

Angewandte Chemie International Edition

Année:

2008

Langue:

english

Fichier:

PDF, 303 KB

english, 2008

48

Copolymerization of propene with phenylnorbornene using ansa-bridged metallocene catalysts

Erkki Aitola, Timo Repo, Christer Bergström, Markku Leskelä

Journal:

Journal of Applied Polymer Science

Année:

2002

Langue:

english

Fichier:

PDF, 178 KB

english, 2002

49

Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges

Markku Leskelae, Mikko Ritala

Journal:

Année:

2004

Fichier:

PDF, 50 KB

2004

50

Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water

V. Pore, A. Rahtu, M. Leskelä, M. Ritala, T. Sajavaara, J. Keinonen

Journal:

Chemical Vapor Deposition

Année:

2004

Langue:

english

Fichier:

PDF, 268 KB

english, 2004